Effects of Surface Oxide on Rapid Thermal Nitridation of Si(001)

Copyright © (1996) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics

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By: M. Copel, R. M. Tromp, H. J. Timme (IBM Semiconductor R&D Ctr.), T. Nakao (Toshiba) and K. Penner (Siemens)

Published in: Journal of Vacuum Science and Technology A, volume 4, (no 2), pages 462-464 in 1996

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