Schiff Base Precursor Compounds for the Chemical Beam Epitaxy of Oxide Thin Films. Part I: Deposition of CuO on MgO[001] Using Copper (II) Bis(benzoylacetone)ethylendiimine

Copyright © (1996) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics

A new precursor compound for the deposition of copper oxide thin films under molecular beam conditions, copper bis(benzoylacetone)-ethylenediimine, has been characterized by thermal analysis and in situ mass spectrometry. Its stability and decomposition behavior are reported as well as its use for the deposition of epitaxial copper oxide thin films on MgO.

By: E. Fritsch (Univ. of Zurich, Switzerland), E. Maechler, F. Arrouy (Univ. of Zurich, Switzerland), H. Berke (Univ. of Zurich, Switzerland), I. Povey (Univ. of Zurich, Switzerland), P. R. Willmott (Univ. of Zurich, Switzerland) and J. P. Locquet

Published in: Journal of Vacuum Science and Technology A, volume 14, (no 6), pages 3208-13 in 1996

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